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Semiconductor Chemistry

Photoresists

Hubbard-Hall and FujiFilm Electronic Material (formerly Arch/Olin) have partnered for over 15 years to deliver quality, technical support and logistics to regional semiconductor manufacturers.

A world leader in advanced materials, Fujifilm’s photoresist product line encompasses a wide range of applications including broadband, g-line, i-line, 248nm, 193nm (dry and immersion), e-beam and EUV technology. The portfolio also includes a unique thin imaging system technology, TIS2000, which addresses the litho-etch tradeoff encountered with advanced low k1 imaging processes for both 193 and 248 nm applications.

For specific product information, please click on one of the attached PDF’s or visit Fujifilm’s website for more information.

Negative Photoresists:

Positive Photoresists